Preparation condition and recombination rates at radiative defects in a-Si:H

摘要

Recombination rates at radiative defects in the hydrogenated amorphous silicon films prepared at various preparation conditions, estimated from intensities and characteristic lifetimes of defect photoluminescence, have been investigated. The temperature variations of the radiative recombination rate are discussed in terms of a model in which the increase of the radiative recombination rate is attributed to the thermal excitation of the holes from deep and strongly localised tail states to shallow and more extended tail states. The temperature variations of nonradiative recombination rate are discussed in terms of a theory for the case of strong electron-phonon coupling.