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Structural and electrical properties of excess PbO doped Pb(Zr_(0.48)Ti_(0.52)O_3 thin films prepared by a MOD process

机译:通过MOD工艺制备的过量PbO掺杂Pb(Zr_(0.48)Ti_(0.52)O_3薄膜的结构和电学性能。

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摘要

Pb(Zr_(0.48)Ti_(0.52)O_3 thin films with 30 mol percent excess Pb were deposited on Pt/Ti/SiO_2/Si(100) substrates at 600 deg C by a metal-organic decomposition process. The Pb/Zr ratio measured by Rutherford backscattering spectroscopy is higher than the stoichiometric ratio. X-ray diffraction measurements show than the PZT film has a perovskite structure but it also contains a PbO_2 phase High resolution transmission electron microscope studies reveal that the nano sized PbO_2 crystals are dispersed quite uniformly in the films. The film exhibits an abnormally slim polarization loop at low applied electric field probably as a result of domain pinning by the PbO_2 crystals. The pinning effect can be overcome by applying a sufficiently high field. The film has good fatigue properties even with the presence of the PbO_2 crystals.
机译:通过有机金属分解工艺,在600℃下,将Pb(Zr_(0.48)Ti_(0.52)O_3过量Pb的薄膜沉积在Pt / Ti / SiO_2 / Si(100)衬底上,Pb / Zr比X射线衍射测量表明,PZT膜具有钙钛矿结构,但也含有PbO_2相;高分辨率透射电镜研究表明,纳米级PbO_2晶体分散得很均匀。薄膜可能在PbO_2晶体中发生畴钉扎,因此在较低的施加电场下会表现出异常细长的极化环,可以通过施加足够高的电场来克服钉扎效应,即使具有PbO_2晶体的存在。

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