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High-Detectivity GaN MSM Photodetectors with Low-Temperature GaN Cap Layers and Ir/Pt Contact Electrodes

机译:具有低温GaN覆盖层和Ir / Pt接触电极的高检测率GaN MSM光电探测器

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摘要

GaN-based metal-semiconductor-metal (MSM) UV, photodetectors (PDs) with a low-temperature (LT) GaN cap layer and Ir/Pt contact electrodes were fabricated. Compared with the conventional Ni/Au contacts, we found that Ir/Pt contacts can reduce the dark current. Further, a smaller dark current and larger UV-to-visible rejection ratio obtained from the PD with LT GaN cap layer and Ir/Pt corfjact electrodes were determined. Furthermore, the noise equivalent power and detectivity (D*) were respectively obtained as 2.75 X 10~(-13) W and 1.76 X 10~(12) cm Hz~(0.5) W~(-1) for the aforementioned PDs.
机译:制作了GaN基金属半导体金属(MSM)UV,具有低温(LT)GaN盖层的光电探测器(PD)和Ir / Pt接触电极。与传统的Ni / Au触点相比,我们发现Ir / Pt触点可以减少暗电流。此外,确定了由具有LT GaN盖层的PD和Ir / Pt伪电极得到的PD中较小的暗电流和较大的UV可见排斥比。此外,对于上述PD,分别获得了2.75 X 10〜(-13)W和1.76 X 10〜(12)cm Hz〜(0.5)W〜(-1)的噪声等效功率和检测率(D *)。

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