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AlGaN/GaN Schottky-barrier UV-B bandpass photodetectors with ITO contacts and LT-GaN cap layers

机译:具有ITO接触层和LT-GaN盖层的AlGaN / GaN肖特基势垒UV-B带通光电探测器

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摘要

Al_(0.2)Ga_(0.8)N/GaN Schottky-barrier ultraviolet (UV)-B bandpass photodetectors (PDs) with indium-tin-oxide (ITO) contact on low-temperature (LT)-GaN cap layers were fabricated and characterized. It was found that dark currents of our PDs were low due to the highly resistive LT GaN cap layers. It was also found that we can realize UV-B PDs with different bandwidths by controlling thickness and annealing conditions. The detectivity, D~*, of the PDs with ITO contacts was also larger than the conventional PDs with Ni/Au contacts.
机译:制备了Al_(0.2)Ga_(0.8)N / GaN肖特基势垒紫外(UV)-B带通光电探测器(PDs),其在低温(LT)-GaN盖层上具有氧化铟锡(ITO)接触。 。发现由于高电阻的LT GaN盖层,我们的PD的暗电流很低。还发现我们可以通过控制厚度和退火条件来实现具有不同带宽的UV-B PD。具有ITO接触的PD的检测灵敏度D〜*也大于具有Ni / Au接触的传统PD的检测灵敏度。

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