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Reduction of dark current in AlGaN/GaN Schottky barrier photodetectors with a low-temperature-grown GaN cap layer

机译:用低温生长的GaN帽层减少AlGaN / GaN肖特基屏障光电探测器中的暗电流

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AlGaN/GaN-based ultraviolet (UV) Schottky barrier photodetectors (PDs) with and without the LT GaN cap layer were both fabricated. It was found that we could achieve a lower leakage current from sample A. With incident light wavelength of 320 nm and a -1 V reverse bias, the measured responsiviyy was around 0.03 A/W and 0.015 AAV for samples with and without the LT GaN cap layer, respectively. The response speed of the sample A was also found to be faster.
机译:AlGaN / GaN的紫外线(UV)肖特基屏障光电探测器(PDS)与LT GaN帽层均为制造。结果发现,我们可以从样品A达到较低的漏电流。当入射光波长为320nm和-1V反向偏置,测量的响应为约0.03A / W和0.015 AAV,适用于带有并且没有GAN的样品帽层分别。还发现样品A的响应速度更快。

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