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Co-doping of Diamond with Boron and Sulfur

机译:金刚石与硼和硫的共掺杂

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Sulfur incorporation in diamond was achieved by co-doping using H_2S and trimethylboron. Particle induced X-ray emission, X-ray photoelectron spectroscopy, and secondary-ion mass spectroscopy confirmed the presence of sulfur, which was more concentrated in the near-surface region. The films were examined by Mott-Schottky analysis, open-circuit potentials in the presence of UV irradiation, and the thermoelectric effect. Diamond films grown with sulfur and limited amounts of boron were n-type; films grown at higher B/S ratios were p-type. The source of the donors is not known; they could arise from near-surface effects, defects, or impurity bands.
机译:通过使用H_2S和三甲基硼进行共掺杂,实现了金刚石中硫的掺入。粒子诱导的X射线发射,X射线光电子能谱和二次离子质谱法证实了硫的存在,硫更集中在近表面区域。通过Mott-Schottky分析,在UV辐射存在下的开路电势以及热电效应来检查膜。用硫和少量硼生长的金刚石薄膜为n型;以较高的B / S比生长的薄膜为p型。捐助者的来源尚不清楚;它们可能来自近表面效应,缺陷或杂质带。

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