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Co-doping of CVD diamond with boron and sulfur.

机译:CVD金刚石与硼和硫的共掺杂。

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Boron is well-established as a p-type dopant in diamond, but attempts to find a viable n-type dopant remain unsuccessful. In 1999, sulfur was reported to give n-type conductivity. However, later measurements indicated that the samples contained boron and were p-type. Recently, we showed that diamond co-doped with sulfur and small quantities of boron shows n-type conductivity, which was established by Mott-Schottky analyses, thermoelectric effect, Hall measurements, scanning tunneling spectroscopy (STS), and UV open-circuit photo-potential. At higher boron concentrations, a transition to p-type behavior is observed due to overcompensation. Experiments performed without boron in the feed gas or without residual boron in the reactor chamber showed no sulfur incorporation and no change in conductivity.; There is evidence that the excess sulfur concentration in the near-surface region is not stable. At room temperature and below, the activation energies range from 0.06 to 0.12 eV. Above 400K there is an irreversible loss in conductivity and the activation energy increases to approximately 1.3 eV. Additionally, we observed by SIMS that there exists a concentration gradient in sulfur with film depth. This sulfur concentration gradient is also observed in our electrical measurements. STS shows a decrease in conductivity with film depth and Hall effect measurements show both p-type and n-type coefficients for samples which are n-type in the near-surface region.; The flat-band potential obtained from the Mott-Schottky experiments is only 1 to 1.5 V more negative on the electrochemical scale than that for boron-doped diamond. This implies that the Fermi level is only 1 to 1.5 eV higher than the Fermi level in boron-doped diamond. This observation implies that the n-type conductivity is not by excitation of electrons to the conduction band, but by an alternate mechanism that occurs in the middle of the band gap. One such possibility is an acceptor impurity band. Electrons from individual donor states can be excited into this acceptor band where they are free to move. This mechanism would create n-type conductivity even if the Fermi level was low in the bandgap.
机译:硼已被公认是金刚石中的p型掺杂剂,但尝试找到可行的n型掺杂剂仍未成功。 1999年,据报道硫具有n型导电性。但是,后来的测量结果表明样品中含有硼并且是p型的。最近,我们发现,掺有硫和少量硼的金刚石显示出n型电导率,这是通过Mott-Schottky分析,热电效应,霍尔测量,扫描隧道光谱(STS)和UV开路照片确定的-潜在。在较高的硼浓度下,由于过度补偿,观察到了向p型行为的转变。进料气中没有硼或反应器室中没有残留硼而进行的实验表明,没有硫的结合,电导率也没有变化。有证据表明,近地表区域的过量硫浓度不稳定。在室温及更低温度下,活化能范围为0.06至0.12 eV。高于400K时,电导率将发生不可逆的损失,活化能增加到约1.3 eV。此外,我们通过SIMS观察到,硫的浓度随膜深的变化而存在。在我们的电气测量中也观察到了这种硫浓度梯度。 STS显示出电导率随膜深度的降低而降低,霍尔效应测量显示出在近表面区域中为n型的样品的p型和n型系数。从Mott-Schottky实验获得的平带电势在电化学尺度上仅比掺硼金刚石多1至1.5 V负电。这意味着费米能级仅比掺硼金刚石中的费米能级高1至1.5 eV。该观察结果暗示,n型导电性不是通过将电子激发到导带,而是通过在带隙中间发生的另一种机制。一种这样的可能性是受体杂质带。来自各个供体态的电子可以被激发进入该受体带,在此处它们可以自由移动。即使带隙中的费米能级较低,该机制也会产生n型电导率。

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