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首页> 外文期刊>ECS Journal of Solid State Science and Technology >Self-Organized Three-Dimensional Nanostructured Architectures in Bulk GaN Generated by Spatial Modulation of Doping
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Self-Organized Three-Dimensional Nanostructured Architectures in Bulk GaN Generated by Spatial Modulation of Doping

机译:掺杂空间调制产生的块状GaN中的自组织三维纳米结构。

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摘要

Self-organized 3D nanostructured architectures including quasi-ordered concentric hexagonal structures generated during the growth of single crystalline n-GaN substrates by hydride vapor phase epitaxy (HVPE) are reported. The study of as-grown samples by using Kelvin Probe Force Microscopy shows that the formation of self-organized architectures can be attributed to fine modulation of doping related to the spatial distribution of impurities. The specific features of nanostructured architectures involved have been brought to light by using electrochemical and photoelectrochemical etching techniques which are highly sensitive to local doping. The analysis of the results shows that the formation of self-organized spatial architectures in the process of HVPE is caused by the generation of V-pits and their subsequent overgrowth accompanied by the growth in variable direction. It is demonstrated for the first time that the electrical and luminescence properties of HVPE-grown GaN are spatially modulated throughout, including islands between overgrown V-pit regions. The dependence of doping upon growth direction is confirmed by the micro-cathodoluminescence characterization of HVPE-grown pencil-like microcrystals exposing various crystallographic planes along the tip. These results are indicative of new possibilities for defect engineering in gallium nitride and for three-dimensional spatial nanostructuring of this important electronic material by controlling the growth direction. (C) 2016 The Electrochemical Society. All rights reserved.
机译:报告了自组织的3D纳米结构,包括通过氢化物气相外延(HVPE)在单晶n-GaN衬底生长期间生成的准有序同心六边形结构。使用开尔文探针力显微镜对生长的样品进行的研究表明,自组织体系结构的形成可归因于与杂质空间分布有关的掺杂的精细调制。通过使用对局部掺杂高度敏感的电化学和光电化学蚀刻技术,已经揭示了所涉及的纳米结构的具体特征。结果分析表明,HVPE过程中自组织空间结构的形成是由V坑的产生及其随后的过度生长以及沿可变方向的生长引起的。首次证明,HVPE生长的GaN的电学和发光特性在整个空间上都得到了调制,包括在过度生长的V坑区域之间的岛。掺杂对生长方向的依赖性通过HVPE生长的笔状微晶的微阴极发光特性得以证实,所述笔状微晶沿尖端暴露出各种晶面。这些结果表明,通过控制生长方向,氮化镓中的缺陷工程以及这种重要电子材料的三维空间纳米结构的新可能性。 (C)2016年电化学学会。版权所有。

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