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首页> 外文期刊>International Journal of Nanotechnology >InAs nanostructures on polar GaAs surfaces
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InAs nanostructures on polar GaAs surfaces

机译:极性GaAs表面上的InAs纳米结构

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摘要

InAs nanostructures were grown by molecular beam epitaxy on GaAs (111)B and (211)B substrates at various growth temperatures between 450℃ and 530℃. Their structural properties were studied by atomic force microscopy. For the (111)B grown nanostructures, the formation of self-aligned InAs quantum dashes was revealed, which in some cases took the form of nanowires. In the (211)B case, the shape and size of nanostructures is drastically affected by growth temperature. At lower growth temperatures, fabrication of quantum dots has been achieved by deposition of 2MLs of InAs. However, when the same amount of InAs was deposited at higher growth temperatures, a drastic change of nanostructure from dots to dashes occurred. Towards a better understanding of nanostructure properties, systematic photoluminescence (PL) measurements were performed on the (211) sample series. No PL emission related to quantum dash formation was observed, while a PL peak position at 1.27 eV was attributed to the (211)B InAs dots grown at 500℃. The PL peak blueshifted upon increasing the excitation intensity, an effect suggested to be related with the existence of strong piezoelectric field in the [211]B direction. The latter was also confirmed in micro-PL experiments through metallic apertures, where a negative biexciton binding energy was observed.
机译:InAs纳米结构通过分子束外延生长在GaAs(111)B和(211)B衬底上,生长温度在450℃至530℃之间。通过原子力显微镜研究了它们的结构性质。对于(111)B生长的纳米结构,揭示了自对准InAs量子虚线的形成,在某些情况下采用纳米线的形式。在(211)B的情况下,纳米结构的形状和大小受生长温度的影响很大。在较低的生长温度下,通过沉积2ML InAs可实现量子点的制造。但是,当在较高的生长温度下沉积相同数量的InAs时,纳米结构会发生从点到虚线的急剧变化。为了更好地了解纳米结构特性,对(211)样品系列进行了系统的光致发光(PL)测量。没有观察到与量子点形成有关的PL发射,而在1.27eV处的PL峰位置归因于在500℃下生长的(211)B InAs点。 PL峰随着激发强度的增加而蓝移,这表明该效应与[211] B方向上强压电场的存在有关。后者也在通过金属孔的micro-PL实验中得到证实,其中观察到负的双激子结合能。

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