机译:通过卤化钠辅助化学气相沉积生长缺陷钝化和光致发光的单层MOS2晶体
China Jiliang Univ Coll Opt &
Elect Technol Hangzhou 310018 Peoples R China;
China Jiliang Univ Coll Opt &
Elect Technol Hangzhou 310018 Peoples R China;
China Jiliang Univ Coll Opt &
Elect Technol Hangzhou 310018 Peoples R China;
China Jiliang Univ Coll Opt &
Elect Technol Hangzhou 310018 Peoples R China;
China Jiliang Univ Coll Opt &
Elect Technol Hangzhou 310018 Peoples R China;
Chinese Acad Sci Shanghai Inst Tech Phys Natl Lab Infrared Phys Shanghai 200083 Peoples R China;
transition metal dichalcogenides; chemical vapor deposition; defect passivation; photoluminescence; density functional theory;
机译:通过卤化钠辅助化学气相沉积生长缺陷钝化和光致发光的单层MOS2晶体
机译:通过化学气相沉积大大增强了纳米结构单层MoS2中的光致发光
机译:通过化学气相沉积在MoS2中注入可控缺陷以增强光致发光
机译:通过化学气相沉积制备的连续单层MOS2的生长机理
机译:通过化学气相沉积合成单层MOS2
机译:在化学气相沉积生长的单层MoS2中与真空水平有关的光致发光
机译:通过卤化钠辅助化学气相沉积生长缺陷钝化和光致发光的单层MOS2晶体
机译:等离子体增强化学气相沉积法制备高质量薄膜Ge单晶