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Defect Passivation and Photoluminescence Enhancement of Monolayer MoS2 Crystals through Sodium Halide-Assisted Chemical Vapor Deposition Growth

机译:通过卤化钠辅助化学气相沉积生长缺陷钝化和光致发光的单层MOS2晶体

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Recent success in the chemical vapor deposition (CVD) growth of atomically thin transition metal dichalcogenide (TMD) crystals opens up prospects for exploiting these materials in nanoelectronic and optoelectronic devices. However, CVD-grown TMDs often suffer from weak crystal quality because of the formation of defects during the growth, which makes a large impact on their electrical and optical properties. Here, we report a facile synthesis of high-quality MoS2 monolayers through a sodium halide-assisted CVD method. Our results show that the addition of sodium halides into MoO3 precursors leads to the rapid growth of highly crystalline MoS2 monolayers. Moreover, the overall photoluminescence (PL) intensity of MoS2 monolayers can be greatly enhanced by up to 2 orders of magnitude. The PL enhancement originates from that the deep trap states induced by sulfur vacancies are passivated by the substitution doping of halogen atoms, which promotes the emission of excitons and trions. Density functional theory calculations indicate that the band gaps of halogen-doped MoS2 monolayers are slightly smaller than those of pristine MoS2 monolayer, which is responsible for the small red shift of PL peaks (similar to 30 meV). These findings provide a new route toward engineering electronic and optical properties of MoS2 and other TMD monolayers.
机译:最近在化学气相沉积中的成功(CVD)原子薄过渡金属二甲基(TMD)晶体的生长打开了用于利用纳米电子和光电器件中这些材料的前景。然而,由于在生长过程中形成缺陷,CVD生长的TMD经常遭受弱晶体质量,这对其电气和光学性能产生了很大的影响。在这里,我们通过卤化钠辅助CVD方法报告了高质量MOS2单层的容易合成。我们的结果表明,将卤化钠加入MOO3前体导致高度晶体MOS2单层的快速生长。此外,MOS2单层的总体光致发光(PL)强度可以大大提高多达2个峰值。 PL增强源自硫磺空位诱导的深阱状态通过替代卤素原子的替代掺杂,这促进了激子和细菌的排放。密度函数理论计算表明卤素掺杂MOS2单层的带间隙略小于原始MOS2单层的间隙,其负责PL峰的小红色偏移(类似于30meV)。这些调查结果为MOS2和其他TMD单层的工程电子和光学性能提供了一种新的途径。

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