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机译:193和248nm在金刚石膜的化学气相沉积对193和248nm的激光光解的影响
Department of Electrical and Computer Engineering University of Nebraska Lincoln Nebraska 68588 United States;
Department of Electrical and Computer Engineering University of Nebraska Lincoln Nebraska 68588 United States;
Department of Electrical and Computer Engineering University of Nebraska Lincoln Nebraska 68588 United States;
Department of Electrical and Computer Engineering University of Nebraska Lincoln Nebraska 68588 United States;
Department of Electrical and Computer Engineering University of Nebraska Lincoln Nebraska 68588 United States;
Department of Electrical and Computer Engineering University of Nebraska Lincoln Nebraska 68588 United States;
机译:193和248nm在金刚石膜的化学气相沉积对193和248nm的激光光解的影响
机译:UV激光诱导的3-BUTYN-2-ONE高效化学气相沉积烃聚合物薄膜
机译:高质量化学气相沉积金刚石膜中的陷获和俘获效应:金刚石颗粒检测器的脉冲形状分析-艺术。没有。 195205
机译:金刚石薄膜和晶体化学气相沉积前体分子的激光共振激发
机译:通过脉冲激光沉积和化学气相沉积合成新型材料:第一部分:氮化碳薄膜的能量沉积和稳定性。第二部分:一维材料和装置的催化生长。
机译:碳氢化合物的紫外激光光解以抑制金刚石膜化学气相沉积中的非金刚石碳
机译:193和248nm在金刚石膜的化学气相沉积对193和248nm的影响
机译:用arF(193 nm)准分子激光脉冲激光沉积非晶类金刚石薄膜