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首页> 外文期刊>Current applied physics: the official journal of the Korean Physical Society >The growth mechanism and supercapacitor study of anodically deposited amorphous ruthenium oxide films
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The growth mechanism and supercapacitor study of anodically deposited amorphous ruthenium oxide films

机译:阳极沉积非晶氧化钌薄膜的生长机理和超级电容器研究

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摘要

In the present study, ruthenium oxide (RuO2) thin films were deposited on the stainless steel (s.s.) substrates by anodic deposition. The nucleation and growth mechanism of electrodeposited RuO2 film has been studied by cyclic voltammetry (CV) and chronoamperometry (CA). The deposited films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and energy dispersive analysis by X-rays (EDAX) for structural, morphological, and compositional studies. The electrochemical supercapacitor study of ruthenium oxide thin films have been carried out for different film thicknesses in 0.5 M H2SO4 electrolyte. The highest specific capacitance was found to be 1190 F/g for 0.376 mg/cm2 film thickness.
机译:在本研究中,通过阳极沉积将氧化钌(RuO2)薄膜沉积在不锈钢(s.s.)基板上。通过循环伏安法(CV)和计时电流法(CA)研究了电沉积RuO2薄膜的成核和生长机理。通过X射线衍射(XRD),扫描电子显微镜(SEM),透射电子显微镜(TEM)和X射线(EDAX)的能量色散分析对沉积膜进行结构,形态和成分研究。对于0.5 M H2SO4电解质中不同的膜厚度,已经进行了氧化钌薄膜的电化学超级电容器研究。对于0.376mg / cm 2的膜厚度,发现最高的比电容为1190F / g。

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