首页> 外文期刊>Journal of the Korean Physical Society >Nickel Doping on Cobalt Oxide Thin Film Using by Sputtering Process-a Route for Surface Modification for p-type Metal Oxide Gas Sensors
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Nickel Doping on Cobalt Oxide Thin Film Using by Sputtering Process-a Route for Surface Modification for p-type Metal Oxide Gas Sensors

机译:通过溅射工艺掺杂氧化钴薄膜的镍掺杂 - P型金属氧化物气体传感器的表面改性途径

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摘要

This study proposes a route for surface modification for p-type cobalt oxide-based gas sensors. We deposit a thin layer of Ni on the Co oxide film by sputtering process and annealed at 350 degrees C for 15 min in air, which changes a typical sputtered film surface into one interlaced with a high density of hemispherical nanoparticles. Our in-depth materials characterization using transmission electron microscopy discloses that the microstructure evolution is the result of an extensive inter-diffusion of Co and Ni, and that the nanoparticles are nickel oxide dissolving some Co. Sensor performance measurement unfolds that the surface modification results in a significant sensitivity enhancement, nearly 200% increase for toluene (at 250 degrees C) and CO (at 200 degrees C) gases in comparison with the undoped samples.
机译:本研究提出了一种用于P型钴氧化物基气体传感器的表面改性途径。 我们通过溅射工艺在CO氧化物膜上沉积薄层Ni,在空气中在350℃下退火15分钟,其将典型的溅射的薄膜表面改变为与高密度的半球形纳米颗粒相互界定的溅射膜表面。 我们深入的材料表征使用透射电子显微镜公开了微观结构演化是CO和Ni广泛扩散的结果,并且纳米颗粒是氧化镍的氧化镍,一些有限公司的表面改性结果展开 与未掺杂的样品相比,对甲苯(250℃)和CO(以200摄氏度为200摄氏度)的CO(以200摄氏度)的气体增加,近200%。

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