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机译:一种缓解金属间介电膜中针孔缺陷的效果的方法
Huazhong Univ Sci &
Technol MOE Key Lab Fundamental Phys Quant Measurement Wuhan 430074 Hubei Peoples R China;
Huazhong Univ Sci &
Technol MOE Key Lab Fundamental Phys Quant Measurement Wuhan 430074 Hubei Peoples R China;
Huazhong Univ Sci &
Technol MOE Key Lab Fundamental Phys Quant Measurement Wuhan 430074 Hubei Peoples R China;
Imperial Coll London Opt &
Semicond Devices Grp Dept Elect &
Elect Engn London SW7 2AZ England;
Beijing Inst Spacecraft Environm Engn Beijing Peoples R China;
Huazhong Univ Sci &
Technol MOE Key Lab Fundamental Phys Quant Measurement Wuhan 430074 Hubei Peoples R China;
Huazhong Univ Sci &
Technol MOE Key Lab Fundamental Phys Quant Measurement Wuhan 430074 Hubei Peoples R China;
Huazhong Univ Sci &
Technol MOE Key Lab Fundamental Phys Quant Measurement Wuhan 430074 Hubei Peoples R China;
Huazhong Univ Sci &
Technol MOE Key Lab Fundamental Phys Quant Measurement Wuhan 430074 Hubei Peoples R China;
Huazhong Univ Sci &
Technol MOE Key Lab Fundamental Phys Quant Measurement Wuhan 430074 Hubei Peoples R China;
pinhole; inter-metal dielectric; thin film; metal etching; defect healing;
机译:一种缓解金属间介电膜中针孔缺陷的效果的方法
机译:低频等离子体沉积的碳膜作为金属间电介质
机译:动态Jon束混合法制备的TiN薄膜的针孔缺陷评估*
机译:一堆两种氟掺杂氧化硅薄膜与互连金属化的叠加金属金属间电介质应用的互连金属化
机译:使用超导谐振器研究介电薄膜中的两级系统缺陷。
机译:溶液浇铸法制备MWCNT /聚(1-丁烯)复合薄膜的晶化和介电性能
机译:通过动态离子束混合方法制备的锡膜的针孔缺陷评价