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首页> 外文期刊>Journal of Electronic Testing: Theory and Applications: Theory and Applications >A reliability statistics perspective on the pitfalls of standard wafer-level electromigration accelerated test (SWEAT)
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A reliability statistics perspective on the pitfalls of standard wafer-level electromigration accelerated test (SWEAT)

机译:标准晶圆级电迁移加速试验(汗水)陷阱的可靠性统计视角

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Standard Wafer Level Electromigration Accelerated Test (SWEAT) has become a common fast wafer level reliability test for electromigration in industry. However, its ability to detect changes in processes and its correlation with conventional electromigration test result has come under close scrutiny. From the perspective of reliability statistics, SWEAT also has other pitfalls that render its test results questionable. In this work, these pitfalls are highlighted, and alternative wafer-level electromigration tests are discussed. The arguments that the SWEAT is not appropriate for evaluation of electromigration of metal lines are presented. SWEAT as a tool to evaluate electromigration lifetime of metal lines is not recommended unless the pitfalls are seriously looked at.
机译:标准晶片级电迁移加速试验(汗水)已成为工业电迁移的常见快速晶圆级可靠性测试。 然而,它能够检测过程中的变化及其与传统电迁移试验结果的相关性已经在紧密审查中。 从可靠性统计的角度来看,汗水还具有其他陷阱,使其测试结果可疑。 在这项工作中,这些陷阱被突出显示,讨论了替代晶片级电迁移测试。 介绍了汗水不适合评估金属线电迁移的争论。 除非严重看着陷阱,否则不推荐作为评估金属线电扫描的工具的工具。

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