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首页> 外文期刊>Plasmonics >Structural, Morphological, and Optical Properties of Nanocrystalline (Bi2O3)(1-x):(TiO2)(x) Thin Films for Transparent Electronics
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Structural, Morphological, and Optical Properties of Nanocrystalline (Bi2O3)(1-x):(TiO2)(x) Thin Films for Transparent Electronics

机译:纳米晶(Bi2O3)(1-X)(1-x):( TiO 2)(x)透明电子薄膜的结构,形态学和光学性质

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摘要

The fabrication of low cost and eco-friendly transparent electronics using metal oxide semiconductors is still a challenging task. In this work, transparent nanocrystalline (Bi2O3)(1-x):(TiO2)(x) thin films were synthesized using a pulsed laser deposition technique (PLD); XRD analysis shows the films have polycrystalline structure of monoclinic Bi2O3; morphological and topographical properties were analyzed by SEM and AFM showing the films have smooth surfaces with RMS roughness (4.26-7.37nm) with micro-and nano-spheres (2m to 23nm); the optical properties were analyzed by Uv-Vis spectrometer and revealed high transmittance in the visible range; the best results were obtained at x=0.05 where the highest crystallinity, highest transmittance (>82%), and highest band gap (3.769eV) were achieved; and empirical models have been proposed to estimate the band gap and Bi-O bond lengths as a function of TiO2 concentration with excellent coincidence with the experimental data.
机译:使用金属氧化物半导体制造低成本和环保透明电子器件仍然是一个具有挑战性的任务。 在该工作中,使用脉冲激光沉积技术(PLD)合成透明纳米晶(Bi2O3)(1-X):( TiO 2)(x)薄膜; XRD分析表明,薄膜具有单晶型Bi2O3的多晶结构; 通过SEM和AFM分析形态学和地形性质,显示薄膜具有平滑的表面,具有M微型和纳米球(2m至23nm)的RMS粗糙度(4.26-7.37mm); 通过UV-Vis光谱仪分析光学性质,并在可见范围内显示出高透射率; 在X = 0.05获得最佳结果,其中最高结晶度,最高透射率(> 82%)和最高带隙(3.769ev)进行了达到; 已经提出了经验模型,以估计带隙和Bi-O键长度,作为TiO2浓度的函数,具有优异的巧合与实验数据。

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