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Influence of annealing on the structural, morphology and optical properties of TiO2 thin films

机译:退火对TiO2薄膜结构,形态和光学性质的影响

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TiO2 thin films were deposited by Spray Pyrolysis with thickness ((350±25) nm) onto glass substrates at (350°C). The influence of annealing temperatures (400,450 and 500°C) on the structural, morphology and optical properties of the films were studied by using X-ray diffraction (XRD), Scanning Electron Microscopic (SEM), Atomic Force Microscopy (AFM), and UV-Visible spectrometry respectively. X-ray diffraction (XRD) analyses appeared that the as-deposited thin films have an amorphous structure, with annealing the amorphous phase was crystallized into tetragonal TiO2 phase, and the size of the crystallites increased from (8.28 to 10.37) nm. Atomic force Microscopy and UV-Visible spectrometry analysis of TiO2 thin films showed that the roughness increased (2.96 to7.63) nm and optical energy gap shift to higher energies with increasing annealing temperature.
机译:通过在(350℃)的玻璃基板上喷雾热解沉积TiO2薄膜。 通过使用X射线衍射(XRD),扫描电子显微镜(SEM),原子力显微镜(AFM)研究退火温度(400,450和500℃)对膜的结构,形态和光学性质的影响,以及 紫外线可见光光谱法。 X射线衍射(XRD)分析似乎沉积的薄膜具有无定形结构,用退火将无定形相结晶到四方TiO 2相中,并且微晶的尺寸增加到(8.28至10.37)nm。 TiO2薄膜的原子力显微镜和UV可见光光谱分析表明,粗糙度增加(2.96至7.63)nm和光能间隙随着退火温度的增加而转变为更高的能量。

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