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Effects of dip-coating speed and annealing temperature on structural, morphological and optical properties of sol-gel nano-structured TiO2 thin films

机译:浸涂速度和退火温度对溶胶-凝胶纳米结构TiO2薄膜的结构,形貌和光学性质的影响

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We reported material characterization of the nano-structured TiO2 thin films prepared by the sol-gel dip-coating process on glass substrates. The dependence of the structural, morphological and optical properties of the synthesized films on the fabrication parameters such as withdrawal velocity and annealing temperature were investigated by the techniques of X-ray diffraction (XRD), Raman spectroscopy (RS), scanning electron microscopy (SEM), atomic force microscopy (AFM) and UV-visible spectrophotometry. The results indicate that for the TiO2 films annealed at 500 degrees C there exhibits (1 0 1) XRD peak corresponding to the anatase phase of TiO2. The latter is consistent with the recorded Raman signal observed at 142 cm(-1) (E-g mode) and 391 cm-1 (B-1g mode), respectively. From the analyses made on the SEM micrographs and AFM images, it was revealed that the morphology and surface roughness of the thin films would depend on the withdrawal speed and the heat treatment temperature. The UV-visible spectroscopy analyses show that all the films were transparent in the visible region with an average transmittance of more than 70%. With an increase on the dip-coating speed from 1 cm/min to 3 cm/min, we observed a spectral red shift of the absorption edge from 3.76 eV to 3.71 eV, indicating a decrease in the bandgap energy (E-g) of the films.
机译:我们报道了通过溶胶-凝胶浸涂工艺在玻璃基板上制备的纳米结构的TiO2薄膜的材料表征。通过X射线衍射(XRD),拉曼光谱(RS),扫描电子显微镜(SEM)等技术研究了合成膜的结构,形貌和光学性质对制备参数如退避速度和退火温度的依赖性。 ),原子力显微镜(AFM)和紫外可见分光光度法。结果表明,对于在500摄氏度下退火的TiO2薄膜,存在(1 0 1)XRD峰,对应于TiO2的锐钛矿相。后者与分别在142 cm(-1)(E-g模式)和391 cm-1(B-1g模式)观察到的拉曼信号一致。从SEM显微照片和AFM图像上进行的分析表明,薄膜的形态和表面粗糙度将取决于抽提速度和热处理温度。紫外可见光谱分析表明,所有薄膜在可见光区域都是透明的,平均透射率超过70%。随着浸涂速度从1 cm / min增加到3 cm / min,我们观察到吸收边的光谱红移从3.76 eV到3.71 eV,表明薄膜的带隙能量(Eg)降低。

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