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Progress on Electronic and Optoelectronic Devices of 2D Layered Semiconducting Materials

机译:2D层半导体材料的电子和光电器件进展

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摘要

2D layered semiconducting materials (2DLSMs) represent the thinnest semiconductors, holding many novel properties, such as the absence of surface dangling bonds, sizable band gaps, high flexibility, and ability of artificial assembly. With the prospect of bringing revolutionary opportunities for electronic and optoelectronic applications, 2DLSMs have prospered over the past twelve years. From materials preparation and property exploration to device applications, 2DLSMs have been extensively investigated and have achieved great progress. However, there are still great challenges for high-performance devices. In this review, we provide a brief overview on the recent breakthroughs in device optimization based on 2DLSMs, particularly focussing on three aspects: device configurations, basic properties of channel materials, and heterostructures. The effects from device configurations, i.e., electrical contacts, dielectric layers, channel length, and substrates, are discussed. After that, the affect of the basic properties of 2DLSMs on device performance is summarized, including crystal defects, crystal symmetry, doping, and thickness. Finally, we focus on heterostructures based on 2DLSMs. Through this review, we try to provide a guide to improve electronic and optoelectronic devices of 2DLSMs for achieving practical device applications in the future.
机译:2D层半导体材料(2DLSMS)代表最薄的半导体,保持许多新颖性质,例如表面悬空粘合粘合,可伸缩带间隙,高柔韧性和人造组件的能力。凭借为电子和光电应用革命机会带来革命性的机会,在过去的十二年中已经繁荣了2DLS。从材料制备和物业勘探到设备应用,2DLSMS已被广泛调查并取得了巨大的进展。但是,高性能设备仍存在巨大挑战。在本文中,我们简要概述了基于2DLSMS的设备优化中最近的突破,特别关注三个方面:设备配置,信道材料的基本属性和异质结构。讨论了装置配置的影响,即电触点,介电层,通道长度和基板。之后,总结了2DLSMS对器件性能的基本特性的影响,包括晶体缺陷,晶体对称性,掺杂和厚度。最后,我们专注于基于2DLSMS的异质结构。通过本综述,我们试图提供改进2DLSMS的电子和光电器件的指南,以实现将来实现实用的设备应用。

著录项

  • 来源
    《Small》 |2017年第35期|共27页
  • 作者单位

    Natl Ctr Nanosci &

    Technol CAS Ctr Excellence Nanosci CAS Key Lab Nanosyst &

    Hierarch Fabricat Beijing 100190 Peoples R China;

    Natl Ctr Nanosci &

    Technol CAS Ctr Excellence Nanosci CAS Key Lab Nanosyst &

    Hierarch Fabricat Beijing 100190 Peoples R China;

    Natl Ctr Nanosci &

    Technol CAS Ctr Excellence Nanosci CAS Key Lab Standardizat &

    Measurement Nanotechno Beijing 100190 Peoples R China;

    Natl Ctr Nanosci &

    Technol CAS Ctr Excellence Nanosci CAS Key Lab Nanosyst &

    Hierarch Fabricat Beijing 100190 Peoples R China;

    Natl Ctr Nanosci &

    Technol CAS Ctr Excellence Nanosci CAS Key Lab Nanosyst &

    Hierarch Fabricat Beijing 100190 Peoples R China;

    Natl Ctr Nanosci &

    Technol CAS Ctr Excellence Nanosci CAS Key Lab Nanosyst &

    Hierarch Fabricat Beijing 100190 Peoples R China;

    Natl Ctr Nanosci &

    Technol CAS Ctr Excellence Nanosci CAS Key Lab Nanosyst &

    Hierarch Fabricat Beijing 100190 Peoples R China;

    Natl Ctr Nanosci &

    Technol CAS Ctr Excellence Nanosci CAS Key Lab Nanosyst &

    Hierarch Fabricat Beijing 100190 Peoples R China;

    Natl Ctr Nanosci &

    Technol CAS Ctr Excellence Nanosci CAS Key Lab Nanosyst &

    Hierarch Fabricat Beijing 100190 Peoples R China;

    Natl Ctr Nanosci &

    Technol CAS Ctr Excellence Nanosci CAS Key Lab Nanosyst &

    Hierarch Fabricat Beijing 100190 Peoples R China;

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  • 正文语种 eng
  • 中图分类 特种结构材料;
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