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Plasma-Chemical Deposition of Diamond-Like Films onto the Surface of Heavily Doped Single-Crystal Diamond

机译:金刚石薄膜的等离子体化学沉积在重掺杂的单晶金刚石表面上

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摘要

The plasma-chemical deposition of diamond-like carbon (DLC) films onto heavily boron-doped single-crystal p-type diamond (the concentration similar to 10(20) cm(-3)) in CH4 + Ar plasma is conducted. The deposition rate is 7 nm min(-1). The elemental composition and properties of the films are studied in detail. It is found that the films are enriched with hydrogen, possess a density of 2.4 g cm(-3), and exhibit an ultrasmooth surface (with a roughness of 0.4 +/- 0.2 nm).
机译:对金刚石碳(DLC)膜的血浆化学沉积在重硼掺杂的单晶P型金刚石上(相对于10(20)厘米(-3))的CH 4 + Ar等离子体的浓度。 沉积速率为7nm min(-1)。 详细研究了膜的元素组成和性质。 发现薄膜富含氢,密度为2.4g cm(-3),并且具有超低表面(粗糙度为0.4 +/- 0.2nm)。

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