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Effect of Annealing on the Dark and Illuminated I(V ) Characterization of a ZnO:Ga|Cu2O Hetero-Junction Prepared by Ultrasonic Spray System

机译:通过超声波喷射系统制备的ZnO:Ga | Cu2O杂连接的暗和照明I(v)表征的影响

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This paper presents the Ultrasonic Spray Pyrolysis system fabrication of gallium-doped zinc oxide (ZnO:Ga)|cuprous oxide (Cu2O) thin film hetero-junction. The deposition parameters were constant for ZnO:Ga and Cu2O. Structural and optical properties of ZnO:Ga, Cu2O, and ZnO:Ga|Cu2O hetero-junction were characterized by X-Ray Diffraction method and UV-Vis spectrometry, respectively. SEM and FTIR were used to reveal the morphology and the nature of the chemical bonds. The electrical properties were measured by an Keithley I-V source meter. The ZnO:Ga|Cu2O hetero-junction was annealed at 350, 400, and 450 degrees C and the current-voltage characteristics were measured. The band gaps of ZnO, Cu2O, and ZnO:Ga|Cu2O are 3.27, 2.65, and 3.29 eV, respectively. The annealing temperature improves the hetero-junction quality.
机译:本文介绍了掺杂掺杂氧化锌(ZnO:Ga)的超声波喷雾热解系统制造(Cu2O)薄膜异质结。 ZnO和Cu2O的沉积参数是恒定的。 ZnO:Ga,Cu 2 O和ZnO:Ga | Cu 2 O杂结的结构和光学性质分别通过X射线衍射法和UV-Vis光谱法表征。 SEM和FTIR用于揭示化学键的形态和性质。 通过Keithley I-V源仪测量电性能。 在350,400和450℃下退火ZnO:Ga | Cu 2 O杂结,测量电流 - 电压特性。 ZnO,Cu 2 O和ZnO:Ga | Cu2O的带间隙分别为3.27,2.65和3.29eV。 退火温度改善了异结质量。

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