Manufacturing method of zinc oxide (ZnO) system and zinc oxide / tin oxide (ZnO / SnO₂) double layer transparent conductive film by ultrasonic spray method

摘要

Since the transparent conductive film is used as a transparent electrode in a thin film display device such as an amorphous silicon solar cell or a liquid crystal display device, it has to have high visible light transmittance, small electrical resistance and chemical stability. In the case of a transparent conductive film for solar cells, multiple scattering of incident sunlight In order to reduce the reflection loss caused by this, the surface shape of the uneven structure should be used.;According to the present invention, a zinc oxide-based thin film is coated on a transparent substrate by atomizing a mixed solution of a zinc compound, a compound of a group III element, water, and methanol using ultrasonic waves, and pyrolyzing and oxidizing it on a heated substrate. It is a method of manufacturing a transparent conductive film.;Zinc oxide transparent conductive film has high visible light transmittance due to large energy interval (prohibition width) of zinc oxide, and has small electric resistance because it contains trace amount of group III element as impurities, and the bonding energy of zinc oxide is very large. It is stable.;In addition, the present invention uses a method of atomizing the raw material mixture solution using ultrasonic waves, unlike the CVD method, the configuration and operation of a thin film manufacturing apparatus is simple, and the trouble of having to independently input raw materials for each material can be avoided.