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Enhancement of electrical conductivity of sol-gel doped ZnO films through Zr doping and vacuum annealing

机译:通过ZR掺杂和真空退火的溶胶掺杂ZnO膜的导电性的提高

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Undoped and Zr doped ZnO thin films were deposited onto the glass substrates using sol-gel spin coating method. A set of deposited films were annealed in vacuum ambience at 350 degrees C, and their structural, optical, electrical, photoluminescence and surface morphological properties are compared with that of the as deposited films. X-ray diffraction patterns showed that all the films fit well with the hexagonal wurtzite structure of ZnO with a preferential growth along the (002) plane. All the films showed high transmittance in the visible region, and the average transmittance is found to be >90%. The electrical resistivity was minimum (4.3x10(-3) V cm) for the annealed film prepared from starting solutions having Zr doping level of 2 at-%, which is one order of magnitude lower than that of its as deposited counterpart. The photoluminescence and SEM results substantiate the discussion on electrical resistance values obtained.
机译:使用溶胶 - 凝胶旋涂法将未掺杂和Zr掺杂的ZnO薄膜沉积在玻璃基板上。 将一组沉积的薄膜在350℃下在真空氛围中退火,并将其结构,光学,电,光致发光和表面形态学性质与作为沉积膜的结构进行比较。 X射线衍射图案表明,所有薄膜与ZnO的六边形紫立岩结构相适合,沿(002)平面优先生长。 所有薄膜在可见区域中显示出高透射率,并且发现平均透射率为> 90%。 电阻率最小(4.3x10(-3)v cm),用于由Zr掺杂水平的起始溶液制备的退火薄膜,其Zr掺杂水平为2at-%,这是比其沉积的对应物的一个量级低一位。 光致发光和SEM结果证实了所获得的电阻值的讨论。

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