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Effects of Sn doping on the optoelectronic properties of reactively evaporated In4Se3 thin films

机译:Sn掺杂对反应性蒸发IN4Se3薄膜光电性能的影响

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Polycrystalline In4Se3: Sn thin films are prepared on glass substrate by reactive evaporation under a vacuum of 10(-5) mbar. The characterizations of the samples are done using XRD, FESEM, XPS and UV-Vis-NIR spectrophotometer. The optical band gap shift of the sample, above the carrier concentration of 1.833 x 10(17) cm(-3), is well described by Burstein-Moss model. The resistivity of the samples is found to decrease as a result of Sn incorporation. Our results show that in all samples, impurity scattering and lattice vibration scattering are the main factors affecting the electrical properties. Photoconductivity studies at room temperature show that visible photoresponsivity of the films increases with increase in Sn concentration. These improvements in optoelectronic properties facilitate the usefulness of such films in device applications.
机译:通过在10(-5)毫巴的真空下,通过反应性蒸发在玻璃基板上制备多晶In4Se3:Sn薄膜。 使用XRD,FESEM,XPS和UV-Vis-Nir分光光度计进行样品的特征。 样品的光带间隙偏移,高于载体浓度为1.833×10(17)厘米(-3),由Burstein-Moss模型很好地描述。 发现样品的电阻率因SN掺入而降低。 我们的结果表明,在所有样品中,杂质散射和晶格振动散射是影响电性能的主要因素。 室温的光电导性研究表明,随着Sn浓度的增加,膜的可见光光偏移量增加。 光电性能的这些改进促进了这种薄膜在装置应用中的有用性。

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