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首页> 外文期刊>International Journal of Surface Science and Engineering >Effects of pH on CdO films deposited onto ITO coated glass substrates by electrodeposition
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Effects of pH on CdO films deposited onto ITO coated glass substrates by electrodeposition

机译:电沉积沉积在ITO涂层玻璃基材上CDO膜对CDO膜的影响

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摘要

Thin films of CdO were deposited onto indium tin oxide (ITO) coated glass substrates using electrodeposition method. The pH of the final solutions was adjusted from 4 to 8 and effects of pH on the films were investigated. The maximum film thickness was reached at pH 5 and XRD studies showed that this film had relatively high peak intensities. Optical studies showed that band gap varies between 2.04 and 2.41 eV and depend on pH. The surface morphologies were analysed by SEM images and they revealed that films were deposited compact and there were no voids, cracks or pinholes.
机译:使用电沉积法将CDO的薄膜沉积在氧化铟锡(ITO)涂覆的玻璃基板上。 将最终溶液的pH调节4至8,并研究了pH对薄膜的影响。 在pH5达到最大膜厚度,并且XRD研究表明该薄膜具有相对高的峰值强度。 光学研究表明,带隙在2.04和2.41eV之间变化,取决于pH值。 通过SEM图像分析表面形态,并显示薄膜沉积紧凑,没有空隙,裂缝或针孔。

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