机译:单目标磁控溅射沉积多组分金属玻璃膜
WPI-Advanced Institute for Materials Research Tohoku University 2-1-1 Katahira Sendai 980-8577 Japan;
WPI-Advanced Institute for Materials Research Tohoku University 2-1-1 Katahira Sendai 980-8577 Japan;
WPI-Advanced Institute for Materials Research Tohoku University 2-1-1 Katahira Sendai 980-8577 Japan;
Glasses; metallic; Thin films; Vapour deposition (physical and chemical); Microscopy; various;
机译:单目标磁控溅射沉积多组分金属玻璃膜
机译:阴极磁场作用下射频磁控溅射制备铋酸盐掺b波导放大器多组分玻璃膜的折射率变化
机译:阴极磁场作用下射频磁控溅射制备铋酸盐掺waveguide波导放大器多组分玻璃膜的折射率变化
机译:高真空条件下微波ECR等离子源离子注入的磁控溅射沉积概要合成金属基板上的陶瓷膜
机译:非晶态中子和拉曼散射对非晶态金属的振动动力学(金属玻璃,光谱学,薄膜,铁磁,溅射沉积)。
机译:磁控溅射Cu-Zr-Al金属玻璃薄膜的制备腐蚀和力学性能
机译:使用合金靶通过RF磁控溅射制备的Zrcunial金属玻璃膜