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Deposition of multicomponent metallic glass films by single-target magnetron sputtering

机译:单目标磁控溅射沉积多组分金属玻璃膜

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Multicomponent metallic glass films inheriting the superior mechanical properties and wide supercooled liquid regions of their bulk counterparts attract increasing attentions for applications in micro-electro-mechanical systems and nano-devices. In this paper, we systematically investigated the growth of multicomponent metallic glass films synthesized using single-target magnetron sputtering. It was found that the working argon gas pressures (P_(Ar)) and sputtering power are two key factors governing film growth and composition. At high P_(Ar), the glassy films grow via a columnar mode, leading to rough film surface. At low P_(Ar), the films exhibit a negative growth exponent and a nearly atomically flat surface. At appropriate sputtering power and P_(Ar), the films can completely inherit the composition of alloy targets, which makes it possible to fabricate multicomponent glassy films with controllable composition using single targets. The mechanisms accounting for the growth of the glassy films are discussed in the framework of dynamic scaling theory. The diversely tunable film microstructure and composition are expected to lead metallic glasses towards new functional applications.
机译:多组分金属玻璃膜继承散装对应物的优越机械性能和宽过冷液体区域,吸引了微电机械系统和纳米器件中的应用的增加的注意。在本文中,我们系统地研究了使用单目标磁控溅射合成的多组分金属玻璃膜的生长。结果发现,工作氩气压(P_(AR))和溅射功率是治疗薄膜生长和组成的两个关键因素。在高P_(AR)中,玻璃膜通过柱状模式生长,导致粗膜表面。在低P_(AR)中,薄膜表现出负生长指数和几乎原子平坦的表面。在适当的溅射功率和P_(AR)中,薄膜可以完全继承合金靶标的组合物,这使得可以使用单靶具有可控组合物制造多组分玻璃膜。在动态缩放理论的框架框架中讨论了对玻璃膜生长的机制。预期可调谐的薄膜微观结构和组合物预计将在新的功能性应用中引导金属玻璃。

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