机译:孔径对多孔硅制备的多二二种BifeO_3薄膜铁电性能的影响
Ferroelectric Materials and Devices Research Laboratory Department of Physics Indian Institute of Technology Roorkee Uttarakhand 247667 India;
Radio Frequency Integrated Circuits Research Laboratory Department of Electronics and Computer Engineering Indian Institute of Technology Roorkee Uttarakhand 247667 India;
Ferroelectric Materials and Devices Research Laboratory Department of Physics Indian Institute of Technology Roorkee Uttarakhand 247667 India;
Multiferroic; Porous silicon; Remanent polarization; Switching;
机译:孔径对多孔硅制备的多二二种BifeO_3薄膜铁电性能的影响
机译:多铁性BiFeO_3薄膜的铁电尺寸效应
机译:Perovskite多重BIFEO_3薄膜的MOCVD生长:掺杂在A和/或B位点对结构,形态和铁电性能的影响
机译:预退火和退火温度对化学溶液沉积制备的多二二种BifeO_3薄膜微观结构和光学性能的影响(CSD)
机译:CSD制备的PZT膜的压电和铁电性质及其应用
机译:多铁/铁电双层薄膜的结构电磁和电阻转换特性
机译:独立式多孔硅膜的微观结构和光学性质:硅纳米晶体中吸收光谱的尺寸依赖性
机译:铁电90(度)域形成与化学制备的pb(Zr,Ti)O(sub 3)薄膜电性能的关系