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Effect of pore size on ferroelectric properties of multiferroic BiFeO_3 films prepared on porous silicon

机译:孔径对多孔硅制备的多二二种BifeO_3薄膜铁电性能的影响

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The ferroelectric properties of BiFeO_3 (BFO) films spray deposited on porous silicon have been studied. The analysis of XRD and FESEM investigations show that the crystalline strain in the BFO films increases with pore size. The BFO films on porous silicon substrate showed improvement in ferroelectric fatigue behavior, remanent polarization and ferroelectric switching time. A maximum memory window of 5.54 V at 1 MHz and a large remanent polarization (P_r) of 13.1 μC/cm~2 have been obtained at room temperature. The improvement in the ferroelectric properties of these films has been correlated to the crystalline strain.
机译:研究了沉积在多孔硅上的BifeO_3(BFO)膜喷雾的铁电性能。 XRD和FESEM研究的分析表明,BFO薄膜中的结晶菌株随孔径而增加。 多孔硅衬底上的BFO薄膜显示出铁电疲劳行为,剩磁极化和铁电切换时间的改善。 在室温下获得了1MHz的最大内存窗口,5.54V,13.1μC/ cm〜2的大的剩余极化(P_R)。 这些薄膜的铁电性质的改善与结晶菌株相关。

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