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首页> 外文期刊>Crystal growth & design >Crystal Growth of Nonpolar m-Plane ZnO on a Lattice-Matched (100) gamma-LiAlO2 Substrate
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Crystal Growth of Nonpolar m-Plane ZnO on a Lattice-Matched (100) gamma-LiAlO2 Substrate

机译:晶格匹配的(100)γ-LiAlO2衬底上非极性m平面ZnO的晶体生长

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摘要

In this study, a nearly lattice-matched (100) gamma-LiAlO2 single crystal was demonstrated as a potential substrate for the epitaxial growth of nonpolar ZnO materials. The adopted growth approach is a simple chemical vapor deposition (CVD) method. The orientation was identified as the [10-10] orientation (m-plane) by the X-ray diffraction pattern. Characterization Of further structures and the defects of nonpolar ZnO films were performed by field emission transmission electron microscopy (FETEM). Roorn-temperature photoluminescence spectra of nonpolar ZnO showed a strong UV emission peak at around 377 nm and a negligible green band emission. The dependence of growth characteristics on the growth temperatures, deposition time, and chamber pressure were investigated.
机译:在这项研究中,几乎晶格匹配的(100)γ-LiAlO2单晶被证明是非极性ZnO材料外延生长的潜在衬底。采用的生长方法是简单的化学气相沉积(CVD)方法。通过X射线衍射图将取向确定为[10-10]取向(m平面)。通过场发射透射电子显微镜(FETEM)对非极性ZnO膜的其他结构和缺陷进行了表征。非极性ZnO的Roorn温度光致发光光谱在377 nm处显示很强的UV发射峰,而绿色谱带的发射可忽略不计。研究了生长特性对生长温度,沉积时间和腔室压力的依赖性。

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