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机译:具有优异介电性能的Al掺杂HFO2薄膜的聚合物辅助沉积
Pohang Univ Sci &
Technol Dept Mat Sci &
Engn 77 Cheongam Ro Pohang Si 37673 Gyeongsangbuk D South Korea;
LG Chem Basic Mat &
Chem R&
D 55 Yeosusandan 2 Ro Yeosu Si 59611 Jeollanam Do South Korea;
Pohang Univ Sci &
Technol Dept Chem Engn 77 Cheongam Ro Pohang Si 37673 Gyeongsangbuk D South Korea;
Pohang Univ Sci &
Technol Dept Mat Sci &
Engn 77 Cheongam Ro Pohang Si 37673 Gyeongsangbuk D South Korea;
Pohang Univ Sci &
Technol Dept Mat Sci &
Engn 77 Cheongam Ro Pohang Si 37673 Gyeongsangbuk D South Korea;
Pohang Univ Sci &
Technol Dept Mat Sci &
Engn 77 Cheongam Ro Pohang Si 37673 Gyeongsangbuk D South Korea;
Al doping; HfO2 thin films; high-k dielectrics; polymer-assisted deposition; solution process;
机译:具有优异介电性能的Al掺杂HFO2薄膜的聚合物辅助沉积
机译:HfO2缓冲层对脉冲激光沉积Ba0.6Sr0.4TiO3薄膜介电性能和漏电流的影响
机译:原子层沉积生长的超薄Al掺杂HfO2非晶薄膜的结晶行为
机译:RF磁控溅射溅射压力沉积抗氮锌薄膜性能研究
机译:金属有机化学气相沉积法制备钽酸钽铌酸钾薄膜的结构,介电和光学性质
机译:等离子体增强原子层沉积在低温下沉积的HfO2薄膜的结构光学和电学性质
机译:掺杂剂浓度对电沉积法制备高效CuZnSnS薄膜太阳能电池用透明导电Al掺杂ZnO薄膜性能的影响