机译:原子层沉积生长的超薄Al掺杂HfO2非晶薄膜的结晶行为
Integrated Circuit Advanced Process R & D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;
University of Chinese Academy of Sciences, Beijing 100049, China;
Integrated Circuit Advanced Process R & D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;
University of Chinese Academy of Sciences, Beijing 100049, China;
Integrated Circuit Advanced Process R & D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;
University of Chinese Academy of Sciences, Beijing 100049, China;
Integrated Circuit Advanced Process R & D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;
University of Chinese Academy of Sciences, Beijing 100049, China;
Integrated Circuit Advanced Process R & D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;
University of Chinese Academy of Sciences, Beijing 100049, China;
National Center for Nanoscience and Technology, Beijing 100190, China;
Integrated Circuit Advanced Process R & D Center, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;
University of Chinese Academy of Sciences, Beijing 100049, China;