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Thermoelectric and electronic properties of B-doped graphene nanoribbon

机译:B掺杂石墨烯纳米镁的热电和电子性能

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The effect of concentration and position of boron atoms as impurities in graphene nanoribbons have been studied through density functional theory (DFT) and the Landauer approach. For this purpose, we designed a graphene nanoribbon doped with three different concentrations of boron atoms and calculated the density of states (DOS), electronic current, and thermopower. The comparison between the DOS curve of the pure graphene and that of the boron-doped graphene shows that the presence of boron atoms as impurities in graphene has caused an energy gap near the Fermi energy. Moreover, the study of the I-V characteristics shows that not only the current quantization is established, but also the reduction in conductivity caused by doping with boron atoms can be observed; however, this reduction is not sensitive to the concentration of boron atoms. In addition, the changes of the Seebeck coefficient shows that in both pure and boron-doped graphene, the curve has a minimum value at the temperature of 10 K, which decreases to a lower value by increasing the concentration of boron atoms. Generally, the result of calculations shows that by increasing the boron concentration, not only the energy gap of graphene is changed, but also several changes appear in its thermoelectric properties that can be attributed to the impurity potential distribution. The results of this study can be effectively used for designing semiconductor electronic devices based on the graphene nanoribbon.
机译:通过密度泛函理论(DFT)和Landauer方法研究了硼原子的浓度和位置作为石墨烯纳米中的杂质的影响。为此目的,我们设计了一种掺杂有三种不同浓度的硼原子的石墨烯纳米孔,并计算出状态(DOS),电子电流和散热器的密度。纯石墨烯的DOS曲线与硼掺杂石墨烯之间的比较表明,作为石墨烯中的杂质的硼原子的存在导致了在费米能量附近的能隙。此外,对I-V特性的研究表明,不仅可以建立电流量化,而且可以观察到由硼原子掺杂引起的导电性的降低;然而,这种降低对硼原子的浓度不敏感。另外,塞贝克系数的变化表明,在纯和硼掺杂的石墨烯中,曲线在10k的温度下具有最小值,通过增加硼原子的浓度降低到较低的值。通常,计算结果表明,通过增加硼浓度,不仅改变了石墨烯的能隙,而且几种变化出现在其热电性质中,其可归因于杂质电位分布。该研究的结果可以有效地用于设计基于石墨烯纳米的半导体电子器件。

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