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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Optical, electronic and visible-range photo-electronic properties of boron carbide-indole films
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Optical, electronic and visible-range photo-electronic properties of boron carbide-indole films

机译:硼碳化物吲哚薄膜的光学,电子和可见光光电特性

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Semiconducting aromatic boron carbide films have been formed by plasma enhanced chemical vapor deposition (PECVD) fromcloso-1,2-dicarbadodecarborane (orthocarborane) and indole precursors. X-ray photoemission and ellipsometry indicate that the films consist of intact indole moieties bonded to the B sites on orthocarborane icosahedra. The ellipsometry measurements, of the PECVD hydrogenated boron carbide alloyed with indole moieties, indicate indirect and direct band gaps of 1.6 eV and 3.5 eV, respectively, in good agreement with density functional theory cluster calculations. These calculations also indicate that states near the valence band maximum and conduction band minimum are associated with indole and carborane moieties, respectively. The current versus voltage (I(V)) curves, of PECVD hydrogenated boron carbide alloyed with indole moieties to n-type silicon diodes, indicate a photocurrent at zero bias, with an appreciable open-circuit voltage of 1 V. The 4th quadrant conductivity and voltage, at the maximum power point, were 1.66 mu A and 0.69 V respectively, under illumination. The frequency- and bias-dependent capacitance versus voltage (C(V)) data yield mean carrier lifetimes from 2.5 ms to 1.5 ms at low and high bias, respectively at 10 kHz, but falling to 0.5 ms, independent of bias voltage, at 100 kHz.
机译:通过血浆增强的化学气相沉积(PECVD)从Clloso-1,2-二碳二癸烷(Orthocarborane)和吲哚前体形成半导体芳族碳化铜膜。 X射线照相机和椭圆形状表明,薄膜由粘合到Orthocarborane Icosahedra上的B位点的完整吲哚部分。与吲哚部分合金化的PECVD氢化硼碳化物的椭圆测量测量值分别表示与密度泛函理论集群计算的良好一致的间接和直接带间隙为1.6eV和3.5eV。这些计算还表明,价带最大值和导通带附近的状态分别与吲哚和碳硼烷部分相关联。 PECVD氢化碳化硼的电流与电压(I(v))曲线合金合金与N型硅二极管相处,表示光电流以零偏置,具有1 V的明显开口电压。第四象限电导率在照明下,最大功率点的电压分别为1.66μA和0.69V。频率和偏置依赖性电容与电压(C(v))数据分别在10kHz处的低偏压和高偏压下屈服平均载体寿命,但在10kHz下降到0.5ms,与偏置电压无关,在100 kHz。

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