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Tribological and Electrical Properties of Chromium-Doped Carbon Films Fabricated by Unbalanced Magnetron Sputtering for Medical Stents

机译:医用支架不平衡磁控溅射制备的铬掺杂碳膜的摩擦学和电性能

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摘要

Chromium-doped carbon (Cr: C) films were fabricated by using unbalanced magnetron sputtering with chromium (Cr) and graphite (C) targets. We investigated the structural, tribological, and electrical properties of the Cr: C films fabricated with various target power densities. The surface of all the Cr: C films was smooth and uniform, and the cross section showed a more compact and clear columnar structure as the target power density increased. The root mean square surface roughness increased and the contact angle on the film surface increased with the increase in target power density. Furthermore, the hardness and elastic modulus of the Cr: C films showed improvements, while the resistivity decreased with the increase in target power density. These results are associated with the ion bombardment and resputtering owing to the effects of the applied target power density.
机译:通过使用具有铬(Cr)和石墨(C)靶的不平衡磁控溅射来制造铬掺杂的碳(Cr:C)膜。 我们调查了Cr:C薄膜的结构,摩擦学和电性能,所述C膜用各种目标功率密度制造。 所有Cr:C薄膜的表面光滑均匀,横截面显示出更紧凑且清晰的柱状结构,因为目标功率密度增加。 随着目标功率密度的增加,均方根表面粗糙度增加,膜表面上的接触角增加。 此外,Cr:C膜的硬度和弹性模量显示出改善,而电阻率随目标功率密度的增加而降低。 由于施加的目标功率密度的效果,这些结果与离子轰击和失控相关联。

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