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首页> 外文期刊>Journal of Electronic Materials >Enhanced Electrical and Optical Characteristics of Co/Phenol Red (PR)/Silicon Hybrid Heterojunction for Photodiode and Thermal Applications
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Enhanced Electrical and Optical Characteristics of Co/Phenol Red (PR)/Silicon Hybrid Heterojunction for Photodiode and Thermal Applications

机译:增强CO /酚红色(PR)/硅混合异质结的电气和光学特性,用于光电二极管和热应用

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摘要

A Co/phenol red (PR)/n-Si/Al device has been fabricated and its current-voltage (I-V) characteristics measured between 80 K and 460 K. Junction parameters of the device, such as the ideality factor, barrier height, interface state density, and series resistance (R-s), were determined using standard thermionic emission theory, the Cheung function, and the Norde method. The application of these approaches revealed that n varied between 4.66 and 1.70 in the temperature range of 80 K to 460 K, while phi(b) varied between 0.24 eV and 0.83 eV in the same temperature range. These variations of n and phi(b) can be attributed to the barrier height inhomogeneity in the device. Although PR is generally used in biological applications such as cell culture, it has been observed that such Co/phenol red/n-Si/Al devices may be critical candidates for use in thermal sensors and photodiode applications due to their photoresponse and low-temperature operation for reverse-bias I-V measurements. Furthermore, PR is an alternative to semiconductor materials commonly used in such applications.
机译:已经制造了CO /酚红色(PR)/ N-Si / Al器件,其电流 - 电压(IV)特性在80K和460K之间测量的装置,例如理想因子,屏障高度,接口状态密度和串联电阻(RS),使用标准的热离子发射理论,张功能和Norde方法确定。这些方法的应用显示N在80k至460k的温度范围内的4.66和1.70之间变化,而PHI(B)在相同温度范围内变化0.24eV和0.83eV。 N和PHI(B)的这些变型可归因于装置中的阻挡高度不均匀性。尽管PR通常用于诸如细胞培养的生物应用中,但是已经观察到这种CO /酚红色/ N-Si / Al器件可以是用于热传感器和光电二极管应用的关键候选者,因为它们的光响应和低温操作反向偏置IV测量。此外,PR是常用于这些应用中的半导体材料的替代方案。

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