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首页> 外文期刊>Journal of Electronic Materials >Joining Using Reactive Films for Electronic Applications: Impact of Applied Pressure and Assembled Materials Properties on the Joint Initial Quality
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Joining Using Reactive Films for Electronic Applications: Impact of Applied Pressure and Assembled Materials Properties on the Joint Initial Quality

机译:加入电子应用的反应膜:施加压力和组装材料的影响对关节初始质量

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摘要

The use of local and rapid heating of electronic assemblies can significantly reduce the degradation of temperature-sensitive materials and substrate bowing commonly encountered in electronic applications during the high temperature reflow process. It can also allow assembling electronic packages on a non-planar surface and/or on massive structures that are very complex using a conventional oven for soldering. In order to attach electronic components to substrates, a rapid soldering process using an exothermic reactive foil sandwiched between solder preforms was evaluated. Once the film was activated and reacted, the solder preforms were melted to ensure the adhesion between the assembled materials. The effect of applied pressure on the joint quality, the reactive film thickness, as well as the attached material thickness and physical properties were assessed. Using a 60 mu m thick reactive foil with two 25 mu m thick SnAgCu305 preforms, results show that the fraction of void-free interfacial area between a metallized diode and an active metal braze substrate increased from 34% to 74% with pressure values between 0.5 kPa and 100 kPa, respectively. At a constant pressure of 13 kPa, increasing the reactive foil thickness from 40 mu m to 60 mu m leads to an increase in the void-free interfacial attach area ratio from 20% to 40%, and a value of 54% was achieved by using two 60 mu m foils under the same conditions. The substrate metallization and solder thickness also affect the joint quality. The experimental results are analyzed and correlated with the duration of liquid solder using thermal models.
机译:使用的电子组件的本地和快速加热的可显著降低温度敏感的材料和衬底的降解拉奏期间的高温回流工艺在电子应用中通常遇到的。它也可以允许装配上的非平面表面和/或使用用于焊接的常规烘箱,是非常复杂的大规模的结构的电子封装。为了电子部件连接到基底上,使用夹在预成型焊点之间的放热反应性箔快速焊接工艺进行评价。一旦薄膜被激活和反应时,预成型焊点被熔化以确保组装材料之间的粘附性。在接头质量施加的压力的作用,反应性膜的厚度,以及所连接的材料的厚度和物理性质进行了评估。使用60微米厚的反应性箔具有两个25微米厚SnAgCu305预制件,结果表明,空隙自由界面面积的金属化二极管和活性金属钎焊基片之间的分数从34%0.5之间增加至74%与压力值1kPa和100kPa,分别。在13千帕的恒定压力,增加从40亩所述反应性箔的厚度m设置为60微米导致增加在无空隙的界面从20%附着面积比为40%,和54%的值被实现使用两个60微米的相同条件下箔。衬底金属化和焊锡厚度也影响接头质量。实验结果进行了分析,并使用热模型液态焊料的持续时间相关。

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