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首页> 外文期刊>RSC Advances >Controlling the electronic and optical properties of HfS2 mono-layers via lanthanide substitutional doping: a DFT plus U study
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Controlling the electronic and optical properties of HfS2 mono-layers via lanthanide substitutional doping: a DFT plus U study

机译:通过镧系元素取代掺杂控制HFS2单层的电子和光学性质:DFT加上U学习

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摘要

Two dimensional HfS2 is a material with potential applications in the field of photo-catalysis and advanced solid state devices. Density functional theory with the Hubbard U parameter (DFT+U) calculations were carried out to investigate the structural, electronic and optical properties of lanthanide dopant atoms (LN = La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu) in the HfS2 mono-layer. The calculated electronic band gap for a pristine HfS2 mono-layer is 1.30 eV with a non-magnetic ground state. The dopant substitutional energies under both Hf-rich and S-rich conditions were evaluated, with the S-rich condition for the dopant atoms being negative. This implies that the incorporation of these LN dopant atoms in the HfS2 is feasible and experimental realization possible. The introduction of LN dopant atoms in the HfS2 mono-layer resulted in a significant change of the material properties. We found that the presence of LN dopant atoms in the HfS2 mono-layer significantly alters its electronic ground states by introducing defect states as well as changes in the overall density of states profile resulting in a metallic ground state for the doped mono-layers. The doped mono-layers are all magnetic with the exception of La and Lu dopant atoms. We found that LN dopant atoms in the HfS2 mono-layer influence the absorption and reflectivity spectra with the introduction of states in the lower frequency range (<1.30 eV). Furthermore, we showed that the applicability of doped HfS2 mono-layers as photo-catalysts is very different compared with the pristine HfS2 mono-layer.
机译:二维HFS 2是在光催化和先进的固态装置的领域潜在的应用的材料。密度与哈伯德u参数密度泛函理论(DFT + U)的计算进行了调查的镧系元素掺杂剂原子的结构,电子和光学性质(LN =镧​​,铈,镨,钕,PM,钐,铕,钆,铽,镝,钬,铒,铥,镱和Lu)在HFS 2单层。对于原始HFS 2单层所计算的电子带隙为1.30电子伏特与非磁性基态。既富Hf和S-富条件下掺杂剂替代能量进行评价,与该掺杂剂原子是负富含S-条件。这意味着,在这些HFS 2 LN掺杂剂原子的掺入是可行的,实验实现成为可能。引入在HFS 2 LN掺杂剂原子的单层导致材料性质的变化显著。我们发现,LN掺杂剂原子在HFS 2的存在下通过引入缺陷状态以及在导致对掺杂单层的金属基态状态轮廓总密度变化单层显著改变其电子基态。掺杂单层都与磁性La和路掺杂剂原子的例外。我们发现在该HFS 2 LN掺杂剂原子的单层影响的吸收率和反射率谱与在较低的频率范围内(<1.30 eV)的引入的状态。此外,我们发现,与原始HFS 2单层相比掺杂HFS 2单层作为光催化剂的适用性有很大的不同。

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  • 来源
    《RSC Advances》 |2020年第27期|共7页
  • 作者单位

    North West Univ Fac Engn HySA Infrastruct Ctr Competence South Africa NWU Potchefstroom South Africa;

    Univ Ghana Coll Basic &

    Appl Sci Sch Phys &

    Math Sci Dept Phys Accra Ghana;

    North West Univ South Africa NWU Fac Engn HySA Infrastruct Ctr Competence ZA-2531 Potchefstroom South Africa;

    Univ Nigeria Phys Dept Nsukka Nigeria;

    Nnamdi Azikiwe Univ Dept Phys Phys Awka Anambra State Nigeria;

    Pachhunga Univ Coll Dept Phys PSRC Aizawl 796001 India;

    Univ Djillali Liabes Sidi Bel Abbes Lab Modelisat &

    Simulat Sci Mat Sidi Bel Abbes 22000 Algeria;

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  • 正文语种 eng
  • 中图分类 化学;
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