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首页> 外文期刊>EPL >Graphene-like quaternary compound SiBCN: A new wide direct band gap semiconductor predicted by a first-principles study
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Graphene-like quaternary compound SiBCN: A new wide direct band gap semiconductor predicted by a first-principles study

机译:石墨烯季化合物SIBCN:通过第一原理研究预测的新型宽带隙半导体

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摘要

Due to the lack of two-dimensional silicon-based semiconductors and the fact that most of the components and devices are generated on single-crystal silicon or silicon-based substrates in modern industry, designing two-dimensional silicon-based semiconductors is highly desired. With the combination of a swarm structure search method and density functional theory in this work, a quaternary compound SiBCN with graphene-like structure is found and displays a wide direct band gap. The band gap is of similar to 2.63 eV which is just between similar to 2.20 and similar to 3.39 eV of the highlighted semiconductors SiC and GaN. Notably, the following calculation reveals that SiBCN possesses high carrier mobility with similar to 5.14x10(3) and similar to 13.07x10(3) cm(2) V-1 s(-1) for electron and hole, respectively. Furthermore, the ab initio molecular dynamics simulations also show that the graphene-like structure of SiBCN can be well kept even at an extremely high temperature of 2000 K. The present work tells that designing multicomponent silicides may be a practicable way to search for new silicon-based low-dimensional semiconductors which can match well with the previous Si-based substrates. Copyright (C) EPLA, 2017
机译:由于缺乏二维硅基半导体以及大多数部件和器件在现代工业中的单晶硅或基于硅基基板上产生的,非常需要设计二维硅基半导体。在这项工作中的群结构搜索方法和密度泛函理论的组合中,发现了具有石墨烯结构的四季化合物SIBCN,并显示出宽的直接带隙。带隙与2.63eV类似于与2.20相似,类似于突出的半导体SiC和GaN的3.39eV。值得注意的是,以下计算显示SIBCN具有高载流子迁移率,其具有与5.14x10(3)类似的电子和孔的13.07×10(3)厘米(2)V-1s(-1)。此外,AB Initio分子动力学模拟还表明,即使在2000k的极高温度下,SIBCN的石墨烯结构也可以很好地保持。本工作旨在说明多组分硅化物可以是寻找新硅的可行方法基于先前的SI基底,基于低维半导体的低维半导体。版权所有(c)epla,2017

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  • 来源
    《EPL》 |2017年第2期|共6页
  • 作者单位

    Nanjing Univ Sci &

    Technol Dept Appl Phys Nanjing 210094 Jiangsu Peoples R China;

    Nanjing Univ Sci &

    Technol Dept Appl Phys Nanjing 210094 Jiangsu Peoples R China;

    Nanjing Univ Sci &

    Technol Dept Appl Phys Nanjing 210094 Jiangsu Peoples R China;

    Nanjing Univ Sci &

    Technol Dept Appl Phys Nanjing 210094 Jiangsu Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 物理学;
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