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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Nanoscale structure and the hydrogenation of Pd-capped magnesium thin films prepared by plasma sputter and pulsed laser deposition
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Nanoscale structure and the hydrogenation of Pd-capped magnesium thin films prepared by plasma sputter and pulsed laser deposition

机译:等离子体溅射和脉冲激光沉积制备的Pd包覆镁薄膜的纳米结构和氢化

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摘要

The structural and hydrogen storage properties were studied of nanostructured Mg thin films prepared by two different methods, namely plasma sputter deposition and pulsed laser deposition (PLD). Cross-sectional transmission electron microscopy (TEM) shows that in both cases the films grow in the shape of closely-stacked columns extending throughout the film thickness, while containing polycrystalline grains and grain boundary defects. Subsequent hydrogenation leads to a clear reduction in the presence of such defects. Selected area electron diffraction (SAED) on the films confirms the hcp-Mg to rutile tetragonal MgH_2 transformation upon hydrogenation, following the martensitic-like orientation relationship with Mg(0002)//MgH_2(1100)//Si(002). The hydrogen sorption temperatures reduce significantly from approx 670 to approx 475 K by capping the Mg films with a thin Pd layer, which plays a key role in enhancing the rate-limiting process of dissociating the hydrogen molecules at the sample surface. A maximum hydrogen uptake of 4-7.5 wt percent is reached under optimum hydrogen loading conditions of hydrogen pressures between 0.25 and 1.0 MPa at a temperature of approx 470 K for both types of films. Nevertheless, cycling experiments showed that a clear reduction in hydrogen content occurs within only a few cycles due to partial delamination of the top Pd layer, which poses a clear limit in practical applications.
机译:研究了通过两种不同方法制备的纳米结构镁薄膜的结构和储氢性能,即等离子体溅射沉积和脉冲激光沉积(PLD)。横截面透射电子显微镜(TEM)显示,在两种情况下,薄膜均以紧密堆积的柱状生长,并在整个厚度范围内延伸,同时包含多晶晶粒和晶界缺陷。在这些缺陷的存在下,随后的氢化导致明显的还原。薄膜上的选定区域电子衍射(SAED)证实了氢化后hcp-Mg向金红石四方MgH_2的转变,遵循与Mg(0002)// MgH_2(1100)// Si(002)的马氏体取向关系。通过用薄的Pd层覆盖Mg膜,氢吸附温度从大约670 K显着降低,这在增强样品表面解离氢分子的限速过程中起关键作用。对于两种类型的薄膜,在氢气压力介于0.25和1.0 MPa之间的最佳氢气加载条件下,在大约470 K的温度下,最大吸氢量达到4-7.5 wt%。然而,循环实验表明,由于顶部Pd层的部分分层,氢含量仅在几个循环内发生了明显的减少,这在实际应用中提出了明显的限制。

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