Cure kinetics, glass transition temperature development, and dielectric spectroscopy of a low temperature cure epoxy/amine system

摘要

This article reports a study of the chemical cure kinetics and the development of glass transition temperature of a low temperature (40°C) curing epoxy system (MY 750/HY 5922). Differential scanning calorimetry, temperature modulated differential scanning calorimetry, and dielectric spectroscopy were utilized to characterize the curing reaction and the development of the cross-linking network. A phenomenological model based on a double autocatalytic chemical kinetics expression was developed to simulate the cure kinetics behavior of the system, while the dependence of the glass transition temperature on the degree of cure was found to be described adequately by the Di Benedetto equation. The resulting cure kinetics showed good agreement with the experimental data under both dynamic and isothermal heating conditions with an average error in reaction rate of less than 2 × 10 ~(-3) min ~(-1). A comparison of the dielectric response of the resin with cure kinetics showed a close correspondence between the imaginary impedance maximum and the calorimetric progress of reaction. Thus, it is demonstrated that cure kinetics modeling and monitoring procedures developed for aerospace grade epoxies are fully applicable to the study of low temperature curing epoxy resins.