Maruzen to Up Output of ArF Photoresist Polymer

摘要

Maruzen Petrochemical plans to expand its output capacity for a photoresist material used in the argon fluoride excimer laser lithography of semiconductors,amid growing prospects that the rising circuit density of semiconductors would lead to the increased use of the technology based on the ArF excimer laser with wavelength of 193 nanometers,which enables higher resolution.