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Investigation of the Ti/MgCl2 interface on a Si(111) 7 × 7 substrate

机译:Si(111)7×7衬底上Ti / MgCl2界面的研究

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Photoelectron spectroscopy with synchrotron radiation, low energy electron diffraction, and ionscattering spectroscopy were used in order to study the Ti/MgCl2 interface grown on an atomically clean Si(111) 7 × 7 substrate. A series of high resolution spectra after deposition of a thick MgCl2 layer, step by step deposition of Ti and gradual annealing, indicated a very reactive interface even at room temperature. Strong interaction between the incoming Ti atoms and the MgCl2 layer, leads to the formation of Ti2+ and Ti4+ oxidation states. The interfacial interaction continues even at multilayer Ti coverage mainly by the partial disruption of Mg-Cl bonds and the formation of Ti-Cl sites, rendering this interface a very promising UHV-compatible model of a pre-catalyst for olefin polymerization. After the final annealing, the MgCl2 multilayers desorb while Ti remains on the surface forming a silicide layer on which Cl and Mg atoms are attached.
机译:为了研究在原子清洁的Si(111)7×7衬底上生长的Ti / MgCl2界面,使用了具有同步加速器辐射的光电子能谱,低能电子衍射和离子散射能谱。沉积厚的MgCl2层,逐步沉积Ti和逐步退火之后的一系列高分辨率光谱表明,即使在室温下,其界面也非常活泼。传入的Ti原子与MgCl2层之间的强相互作用导致Ti2 +和Ti4 +氧化态的形成。即使在多层Ti覆盖层上,界面相互作用仍在继续,这主要是由于Mg-Cl键的部分破坏和Ti-Cl位点的形成,使该界面成为烯烃聚合预催化剂的非常有前途的UHV兼容模型。在最终退火之后,MgCl2多层膜解吸,而Ti保留在表面上,形成硅化物层,上面附着有Cl和Mg原子。

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