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首页> 外文期刊>The Journal of Chemical Physics >Grand canonical Monte Carlo simulation of argon adsorption at the surface of silica nanopores:Effect of pore size,pore morphology,and surface roughness
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Grand canonical Monte Carlo simulation of argon adsorption at the surface of silica nanopores:Effect of pore size,pore morphology,and surface roughness

机译:硅纳米孔表面氩吸附的经典正则蒙特卡罗模拟:孔径,孔形态和表面粗糙度的影响

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Argon adsorption (77 K) in atomistic silica nanopores of various sizes and shapes has been studied by means of grand canonical Monte Carlo simulations (GCMC).We discuss the effects of confinement (pore size),pore morphology (ellipsoidal,hexagonal,constricted pore),and surface texture (rough/smooth) on the thickness variation of the adsorbed film with pressure onto the disordered inner surface of porous materials (usually called t-plot or t-curve).We show that no confinement effect occurs when the diameter of the regular cylindrical pore is larger than 10 nm.For pores smaller than 6 nm,we find that the film thickness increases as the pore size decreases.We show that the adsorption isotherm in the rough pore can be described as the sum of an adsorbed amount similar to that found for a smooth pore (of the same radius) and a constant contribution due to atoms "trapped" in the infractuosities of the rough surface which act as a microporous texture.Simulation snapshots for Ar adsorption in hexagonal and ellipsoidal smooth pores indicate that at low pressures the gas/adsorbate interface retains memory of the pore shape and becomes cylindrical prior to the capillary condensation of the fluid in the pore.The film thickness in the hexagonal pore is close to that obtained for a cylindrical pore having a similar dimension.By contrast,we find that the film thickness for an ellipsoidal pore is always larger than that for an equivalent cylindrical pore (having the same length and volume but a circular section).We show that this effect strengthens as the pore size decreases and/or the pore asymmetry increases.Ar adsorption in a cylindrical constricted pore shows that the presence of the narrower part considerably modifies the adsorption mechanism.Finally,we report GCMC simulations of Ar adsorption (77 K) on a plane silica reference substrate for different intermolecular potentials.We discuss the effect of the interaction on the shape of the adsorption isotherm and compare our results with experiments.
机译:通过大经典的蒙特卡洛模拟(GCMC)研究了在各种尺寸和形状的原子化二氧化硅纳米孔中的氩吸附(77 K)。 ),以及在多孔材料的无序内表面(通常称为t形图或t形曲线)上施加压力时,吸附膜厚度变化的表面纹理(粗糙/光滑)。规则的圆柱孔的孔径大于10 nm。对于小于6 nm的孔径,我们发现膜厚度随孔径的减小而增加。我们表明,粗孔中的吸附等温线可以描述为吸附的总和数量类似于在光滑的孔(相同半径)中发现的数量,并且由于原子“捕获”在粗糙表面的孔隙中而产生微孔结构,从而产生恒定的贡献。h中Ar吸附的模拟快照椭圆形和椭圆形的光滑孔隙表明,在低压下,气体/吸附物界面保留了孔隙形状的记忆,并在孔隙中的流体发生毛细管冷凝之前变成圆柱形。六角形孔隙中的膜厚度接近于相比之下,我们发现椭圆形孔的膜厚度总是大于等效的圆柱形孔的膜厚度(具有相同的长度和体积,但截面为圆形)。最后,我们报道了GCMC在平面硅胶上对Ar吸附(77 K)的模拟结果,表明在狭窄的圆柱孔中Ar的吸附明显改变了吸附机理。不同分子间电位的参考底物。我们讨论了相互作用对吸附等温线形状的影响,并比较了我们的结果。与实验。

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