Experimental investigation on plasma parameter profiles on a wafer level with reactor gap lengths in an inductively coupled plasma

摘要

The gap length effect on plasma parameters is investigated in a planar type inductively coupled plasma at various conditions. The spatial profiles of ion densities and the electron temperatures on the wafer level are measured with a 2D probe array based on the floating harmonic method. At low pressures, the spatial profiles of the plasma parameters rarely changed by various gap lengths, which indicates that nonlocal kinetics are dominant at low pressures. However, at relatively high pressures, the spatial profiles of the plasma parameter changed dramatically. These plasma distribution profile characteristics should be considered for plasma reactor design and processing setup, and can be explained by the diffusion of charged particles and the local kinetics. (C) 2015 AIP Publishing LLC.