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首页> 外文期刊>Physical Review, B. Condensed Matter >Thermal stability of semi-insulating InP epilayers: The roles of dicarbon and carbon-hydrogen centers - art. no. 205307
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Thermal stability of semi-insulating InP epilayers: The roles of dicarbon and carbon-hydrogen centers - art. no. 205307

机译:半绝缘InP外延层的热稳定性:二碳和碳氢中心的作用-艺术。没有。 205307

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Infrared- (IR) absorption measurements of localized vibrational modes (LVM's) show the presence of H-C-P pairs and isolated C-P accepters in semi-insulating epitaxial layers of LnP. Rapid transient anneals of two sets of such samples at temperatures of up to 800 degreesC lead to the complete loss of the H-C-p pairs and large decreases of [C-p], from initial values of 5.8 x 10(18) and 2.5 x 10(18) cm(-3). The layers remain semi-insulating up to 700 degreesC and, even after annealing at 800 degreesC, they show only low n-type conductivities (n similar to 10(16) cm(-3)), implying the continued presence of a sufficient concentration of donor centers to effect near compensation. Raman scattering measurements reveal LVM's (IR inactive), close to 1800 cm(-1) and broadbands, due to amorphous carbon, that show increased strengths after annealing. The LVM's are attributed to deep donor dicarbon split-interstitial centers occupying phosphorus lattice sites, analogous to corresponding centers observed in annealed highly carbon-doped p-type GaAs and AlAs that have been investigated by local-density-functional calculations. No evidence is found for the presence of shallow donors, namely VInH4 complexes, C-In donors or P-In antisite defects. Changes in the unusual electric-field broadening of the C-P LVM, revealed by IR measurements, are related to the reductions in the concentration of C-P defects resulting from the anneals. These calculations give further insight about the compensating defects and may imply reductions in strain after the higher-temperature anneals. [References: 41]
机译:局部振动模式(LVM)的红外(IR)吸收测量结果显示,LnP的半绝缘外延层中存在H-C-P对和孤立的C-P受体。从最初的5.8 x 10(18)和2.5 x 10(18)值开始,两组此类样品在最高800摄氏度的温度下进行快速瞬态退火会导致HCp对完全消失,[Cp]大大降低。厘米(-3)。这些层在700摄氏度以下仍保持半绝缘,即使在800摄氏度退火后,它们也仅显示出低n型电导率(n类似于10(16)cm(-3)),这意味着仍存在足够的浓度捐助中心的费用接近补偿。拉曼散射测量结果显示,由于非晶碳,LVM(红外不活跃)接近1800 cm(-1)且宽带,退火后强度提高。 LVM归因于占据磷晶格位点的深施主二碳分裂间隙中心,类似于退火的高碳掺杂p型GaAs和AlAs中已观察到的相应中心,该中心已通过局部密度函数计算进行了研究。没有证据表明存在浅的供体,即VInH4复合体,C-In供体或P-In抗位缺陷。 IR测量显示,C-P LVM异常电场展宽的变化与退火导致的C-P缺陷浓度降低有关。这些计算可提供有关补偿缺陷的更多信息,并可能暗示高温退火后应变降低。 [参考:41]

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