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Evidence of trapping levels and photoelectric properties of Cu_3BiS_3 thin films

机译:Cu_3BiS_3薄膜的俘获能级和光电性能的证据

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摘要

Voltage and Cu/Bi ratio mass dependence of photocurrent was studied in Cu_3BiS_3 thin films prepared by co-evaporation technique. The intensity dependence of steady state photocurrent (I_(ph)) follows a power law with intensity (F), Iph p Fg where the power g is in the range between 0.5 and 1.0, which suggests monomolecular recombination process. Photocurrent signal was found to be decaying as a function of both applied voltage and intensity, initially decreasing at considerably fast rates and later at slower ones due to the continuos distribution of defect states. Additionally, the differential life time constants were calculated. Measurements of temperature effect on conductivity (from 100 K to 450 K) were carried out. It was found that at temperatures greater than 350 K, the conductivity is predominantly affected by transport of free carriers in extended states of the conduction band, whereas in the range of temperatures below 250 K, the conductivity is dominated by the VRH (Variable Range Hopping)transport mechanism.
机译:研究了通过共蒸发技术制备的Cu_3BiS_3薄膜的电压和光电流的Cu / Bi比质量依赖性。稳态光电流(I_(ph))的强度依赖性遵循强度(F)的幂定律Iph p Fg,其中幂g在0.5到1.0之间,这表明单分子重组过程。发现光电流信号根据施加的电压和强度而衰减,由于缺陷状态的连续分布,最初以相当快的速率下降,后来以较慢的速率下降。此外,还计算了寿命的微分常数。测量了温度对电导率的影响(从100 K到450 K)。发现在高于350 K的温度下,电导率主要受导带扩展态中自由载流子的传输的影响,而在低于250 K的温度范围内,电导率受VRH(可变跳频)控制)运输机制。

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