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首页> 外文期刊>Physical chemistry chemical physics: PCCP >Photoinduced hole trapping in single semiconductor quantum dots at specific sites at silicon oxide interfaces
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Photoinduced hole trapping in single semiconductor quantum dots at specific sites at silicon oxide interfaces

机译:氧化硅界面特定位置的单个半导体量子点中的光致空穴陷阱

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Blinking dynamics of CdSe/ZnS semiconductor quantum dots (QD) are characterized by (truncated) power law distributions exhibiting a wide dynamic range in probability densities and time scales both for off- and on-times. QDs were immobilized on silicon oxide surfaces with varying grades of hydroxylation and silanol group densities, respectively. While the off-time distributions remain unaffected by changing the surface properties of the silicon oxide, a deviation from the power law dependence is observed in the case of on-times. This deviation can be described by a superimposed single exponential function and depends critically on the local silanol group density. Furthermore, QDs in close proximity to silanol groups exhibit both high average photoluminescence intensities and large on-time fractions. The effect is attributed to an interaction between the QDs and the silanol groups which creates new or deepens already existing hole trap states within the ZnS shell. This interpretation is consistent with the trapping model introduced by Verberk et al. (R. Verberk, A. M. van Oijen and M. Orrit, Phys. Rev. B, 2002, 66, 233202).
机译:CdSe / ZnS半导体量子点(QD)的闪烁动力学特征是(截断的)幂定律分布,在关断和导通时间内,概率密度和时标均显示出较宽的动态范围。将量子点固定在具有不同等级的羟基化和硅烷醇基团密度的氧化硅表面上。在关闭时间分布不受氧化硅表面特性变化的影响的情况下,在开启时间情况下,观察到与幂律相关性的偏差。该偏差可以通过叠加的单指数函数来描述,并且主要取决于局部硅烷醇基团密度。此外,紧邻硅烷醇基团的量子点显示出高的平均光致发光强度和较大的接通时间分数。该效应归因于量子点和硅烷醇基团之间的相互作用,这会在ZnS壳层中产生新的或加深的空穴陷阱状态。这种解释与Verberk等人介绍的诱捕模型是一致的。 (R.Verberk,A.M.van Oijen和M.Orrit,Phys.Rev.B,2002,66,233202)。

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