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首页> 外文期刊>Nanotechnology >Schottky contact on ultra-thin silicon nanomembranes under light illumination
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Schottky contact on ultra-thin silicon nanomembranes under light illumination

机译:光照下超薄硅纳米膜上的肖特基接触

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By repeating oxidation and subsequent wet chemical etching, we produced ultra-thin silicon nanomembranes down to 10 nm based on silicon-on-insulator structures in a controllable way. The electrical property of such silicon nanomembranes is highly influenced by their contacts with metal electrodes, in which Schottky barriers (SBs) can be tuned by light illumination due to the surface doping. Thermionic emission theory of carriers is applied to estimate the SB at the interface between metal electrodes and Si nanomembranes. Our work reveals that the Schottky contacts with Si nanomembranes can be influenced by external stimuli (like light luminescence or surface state) more heavily compared to those in the thicker ones, which implies that such ultra-thin-film devices could be of potential use in optical detectors.
机译:通过重复氧化和随后的湿法化学蚀刻,我们以可控的方式在绝缘体上硅结构的基础上生产了厚度低至10 nm的超薄硅纳米膜。此类硅纳米膜的电性能受其与金属电极的接触的影响很大,其中由于表面掺杂,肖特基势垒(SBs)可以通过光照来调节。应用载流子的热电子发射理论来估计金属电极和Si纳米膜之间界面处的SB。我们的工作表明,与较厚的硅薄膜相比,肖特基与Si纳米膜的接触受外部刺激(如光致发光或表面状态)的影响更大,这表明此类超薄膜器件可能具有潜在的用途。光学探测器。

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