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Photosensitive hole transport in Schottky-contacted Si nanomembranes

机译:肖特基接触Si纳米膜中的光敏空穴传输

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摘要

When Schottky-contacted Si nanomembranes (SiNMs; 27 nm in thickness) are exposed to light it is mainly the hole transport responding sensitively to the illumination. The electron transport on the contrary remains rather unaffected by the exposure, which cannot be explained by a simple creation of electron-hole pairs. We attribute this effect to the holes activated from SiNM surfaces, which strongly supports the existence of surface doping in SiNMs [P. P. Zhang, E. Tevaarwerk, B. N. Park, D. E. Savage, G. K. Celler, I. Knezevic, P. G. Evans, M. A. Eriksson, and M. G. Lagally, Nature 439, 703-706 (2006)]. Our work suggests that the surfaces play a decisive role when creating and designing optoelectronic devices based on SiNMs.
机译:当肖特基接触的Si纳米膜(SiNMs;厚度为27 nm)暴露在光下时,主要是空穴传输对光照敏感。相反,电子传输仍然不受曝光影响,这不能通过简单地创建电子-空穴对来解释。我们将此效应归因于从SiNM表面激活的空穴,该空穴强烈支持SiNM中表面掺杂的存在[P. P. Zhang,E。Tevaarwerk,B。N. Park,D。E. Savage,G。K. Celler,I。Knezevic,P。G. Evans,M。A. Eriksson,以及M. G. Lagally,Nature 439,703-706(2006)]。我们的工作表明,在创建和设计基于SiNM的光电器件时,表面起着决定性的作用。

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  • 来源
    《Applied Physics Letters》 |2014年第12期|121101.1-121101.4|共4页
  • 作者单位

    Jiangsu Provincial Key Laboratory of Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China;

    Jiangsu Provincial Key Laboratory of Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China;

    Institute for Integrative Nanosciences, IFW Dresden, Helmholtzstr. 20, Dresden D-01069, Germany;

    Department of Materials Science, Fudan University, Shanghai 200433, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:16:00

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