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Current-voltage characteristics of AlCdO Schottky contact on the polished and unpolished p-type Si surfaces with and without light illumination

机译:AlCdO肖特基接触在有光和无光照射下的抛光和未抛光p型Si表面上的电流-电压特性

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摘要

In this study, the current-voltage characteristics of the AlCdO/unpolished p-type Si and AlCdO/polished p-type Si Schottky diodes with and without light illumination were examined. It is found that the Schottky barrier height (the series resistance) of the AlCdO/unpolished p-type Si Schottky diode is higher (lower) than that of the AlCdO/polished p-type Si Schottky diode. The power conversion efficiency of the AlCdO/p-type Si devices in the light (AM 1.5 G, 100 mW/cm~2) was improved by increasing built-in potential at the AlCdO/p-type Si interfaces and reducing the device series resistance and surface reflectivity. It is shown that the device surface roughness plays an essential role in improving the device performance.
机译:在这项研究中,研究了AlCdO /未抛光p型Si和AlCdO /抛光p型Si肖特基二极管的有无光照明的电流-电压特性。发现AlCdO /未抛光p型Si肖特基二极管的肖特基势垒高度(串联电阻)比AlCdO /抛光p型Si肖特基二极管的肖特基势垒高度(串联电阻)高(低)。通过增加AlCdO / p型Si界面的内置电势并减少器件系列,提高了AlCdO / p型Si器件在光(AM 1.5 G,100 mW / cm〜2)的情况下的功率转换效率电阻和表面反射率。结果表明,器件表面粗糙度在提高器件性能方面起着至关重要的作用。

著录项

  • 来源
    《Solid-State Electronics》 |2011年第1期|p.116-120|共5页
  • 作者单位

    Institute of Photonics, National Changhua University of Education, Changhua 500, Taiwan;

    Institute of Photonics, National Changhua University of Education, Changhua 500, Taiwan;

    Department of Physics, National Changhua University of Education, Changhua 500, Taiwan;

    Department of Physics, National Changhua University of Education, Changhua 500, Taiwan;

    Institute of Photonics, National Changhua University of Education, Changhua 500, Taiwan;

    Institute of Photonics, National Changhua University of Education, Changhua 500, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    si; transparent conductive oxide; schottky diode; thermionic emission;

    机译:硅;透明导电氧化物;肖特基二极管;热电子发射;

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