...
首页> 外文期刊>Chemical Weekly >Rohm and Haas opens technical centre in Taiwan to support chemical mechanical planarization applications
【24h】

Rohm and Haas opens technical centre in Taiwan to support chemical mechanical planarization applications

机译:罗门哈斯在台湾开设技术中心,以支持化学机械平面化应用

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

Rohm and Haas Electronic Materials, CMP Technologies, a leading player in chemical mechanical planarization (CMP) technology for the global semiconductor industry, has opened a new Asia Technical Center (ATC) in Hsinchu, Taiwan. The ATC allows CMP Technologies to collaborate more closely with Asian-based customers to help optimise advanced CMP processes and consumable sets, as well as provide engineering and technical support throughout the Asia-Pacific region.
机译:罗门哈斯电子材料公司(CMP Technologies)是全球半导体行业化学机械平面化(CMP)技术的领先参与者,该公司已在台湾新竹成立了新的亚洲技术中心(ATC)。通过ATC,CMP Technologies可以与亚洲客户进行更紧密的合作,以帮助优化先进的CMP流程和易耗品,并在整个亚太地区提供工程和技术支持。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号